Figure 5From: Masking as an effective quality control method for next-generation sequencing data analysisAlignments for the second false-negative SNP at chromosome X:484,613. (a) no quality control – BWA, (b) trimming – BWA, (c) masking – BWA, (d) no quality control – BOWTIE2, (e) trimming – BOWTIE2, and (f) masking – BOWTIE2. See the Figure 3 legend for details on coloring.Back to article page